T50B Masterbatch

Mechnano’s T50B Masterbatch, made in partnership with Bomar, is a specialized lower viscosity product aimed at Additive Manufacturing (AM) industry formulators. The Masterbatch uses Mechnano’s proprietary technology, known as D’Func™ (Discrete, Dispersed, and Functionalized Carbon Nanotubes), enabling the development of AM resins with enhanced mechanical properties and uniform electrical performance on a nano scale.

The T50B is a masterbatch with high CNT concentration and low viscosity, designed to seamlessly blend into resin formulas without the need for intensive shear mixing processes. The proprietary blend of Bomar resins used for the dispersion base enables a broad range of resin types and technologies, such as tough, flexible, and elastic AM resins suitable for SLA, DLP, or jetting print methodologies.

The electric resistivity of the final formulation can be adjusted from 10⁵-10¹⁰ Ω, making it an excellent choice for the development of low surface resistivity resins. Furthermore, incorporating the T50B into tough and flexible formulas has demonstrated enhancements in mechanical performance such as tensile strength and modulus.

T50B is a versatile, highly concentrated dispersion that enables maximum formulation flexibility and provides excellent ESD properties, all while maintaining printability in UV-based print systems.

T50B offered by Mechnano makes use of their unique D’Func process. This technology specifically targets the problem of clumped and roped carbon nanotubes (CNTs) present in materials with its primary objective to enhance both the mechanical and electrical performance of AM resins. By effectively eliminating these clumps and functionalizing CNTs, Mechnano ensures the stability of our CNT-based masterbatches. This element holds significant importance as clumped CNTs have been proven to adversely affect the mechanical properties of materials, resulting in subpar overall performance of the components.

Additional Resources

T50B Masterbatch

4X more concentrated than E35B

Perfect for tough, flexible, and elastomeric vat photopolymerization or jettable 3D printing resins

Final resin formulations can be tunable from 10⁵-10¹¹ Ω/sq resistivity

Isotropic, Nano-Uniform ESD performance

No carbon trails

No need for continuous resin mixing